Journal of Shenyang Aerospace University >
Defect mechanisms and resolution approaches in ceramic vat photopolymerization additive manufacturing
Received date: 2026-03-18
Revised date: 2026-04-11
Accepted date: 2026-04-15
Online published: 2026-09-02
During the preparation of complex-structured ceramic parts using ceramic vat photopolymerization additive manufacturing technology, various types of defects are readily generated due to the inherent attributes of the material system, the layer-by-layer printing principle, and the post-processing techniques. In order to resolve the constraints and damages caused by these defects to part forming accuracy, service performance, and technology promotion, a systematic investigation was conducted on the defect formation mechanisms and control strategies in ceramic vat photopolymerization additive manufacturing. Firstly, two types of defects existing in ceramic vat photopolymerization additive manufacturing were summarized, namely morphology defects (such as dimensional deviation and morphological distortion) and structural defects (such as anisotropy and porosity), and their complex formation mechanisms were revealed. Then, defect analysis methods based on theoretical modeling and numerical simulation were summarized. In terms of defect control and performance improvement, not only were traditional optimization methods including degassing, slurry improvement, and optimization of debinding and sintering summarized, but also innovative strategies such as “microstructure design” were discussed. Finally, the research directions and development priorities worthy of future attention were summarized and prospected, with a view to providing theoretical reference and practical guidance for promoting the development of high-performance ceramic vat photopolymerization additive manufacturing technology.
Yuhui ZHAO , Jianwen WANG , Zhenfeng HE , Zhiguo WANG , Siyu ZHOU , Chen HE , Jibin ZHAO . Defect mechanisms and resolution approaches in ceramic vat photopolymerization additive manufacturing[J]. Journal of Shenyang Aerospace University, 2026 , 43(4) : 14 -27 . DOI: 10.3969/j.issn.2095-1248.2026.04.002
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